摘要 : A comprehensive technique for the accurate extraction of the effective lateral doping abruptness and the spreading-resistance components in source/drain extension (EXT) regions is presented by FET on-resistance characterization an... 展开
作者 | Kim~ S.-D. Narasimha~ S. Rim~ K. |
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期刊名称 | 《IEEE Transactions on Electron Devices》 |
页码/总页数 | p.1035-1041 / 7 |
语种/中图分类号 | 英语 / TM10 TN |
关键词 | Lateral doping abruptness MOSFETs on-resistance overlap capacitance series resistance spreading resistance |
DOI | 10.1109/TED.2008.917548 |
馆藏号 | IELEP0099 |