摘要 : Apart from excellent electrostatic capability and immunity to short-channel effects, the performance of gate-all-around (GAA) nanowire (NW) metal-oxide-semiconductor field-effect transistors (MOSFETs) can be further enhanced by in... 展开
作者 | Kumar~ Subindu Kumari~ Amrita Das~ Mukul Kumar |
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作者单位 | |
期刊名称 | 《Journal of Computational Electronics》 |
页码/总页数 | 47-60 / 14 |
语种/中图分类号 | 英语 / TM |
关键词 | Aspect ratio GAA MOSFETs Series resistance Strain |
DOI | 10.1007/s10825-016-0941-z |
馆藏号 | TM-073 |