摘要 : Diamond films with 70 mm in diameter were deposited on silicon substrates with Ar/CH4/H-2 gas mixture, using microwave plasma chemical vapor deposition (MPCVD) technique. One designed water-cooling substrate stage was used to impr... 展开
作者 | Weng~ J. Liu~ F. Xiong~ L. W. Wang~ J. H. Sun~ Q. |
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作者单位 | |
期刊名称 | 《Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology》 |
总页数 | 9 |
语种/中图分类号 | 英语 / TB7 TB79 |
关键词 | Large area diamond film High microwave power Uniformity Microwave plasma Chemical vapor deposition |
馆藏号 | N2007EPST0002834 |