摘要 : We have systematically studied the interaction of ultrapure, de-ionized water droplets with chemically amplified, deep-ultraviolet photoresist layers during evaporation by means of experiments. The contact lines of the evaporating... 展开
作者 | He~ Bojia Darhuber~ Anton A. |
---|---|
作者单位 | |
期刊名称 | 《Colloids and Surfaces, A. Physicochemical and Engineering Aspects》 |
总页数 | 8 |
语种/中图分类号 | 英语 / O648 |
关键词 | Evaporation Droplet evaporation Evaporation residues Deliquescence |
馆藏号 | N2008EPST0000646 |