摘要: The design of broad-beam industrial ion sources is described. The approach used emphasizes refractory metal cathodes and permanent-magnet multipole discharge chambers. Design procedures and sample calculations are given for the di... 展开
作者 | Kaufman, H. R. Robinson, R. S. | ||
---|---|---|---|
原报告号 | N81-24878 | 总页数 | 80 |
报告类别/文献类型 | NASA / NTIS科技报告 | ||
关键词 | Electron bombardment Gas discharges Ion sources Plasma potentials Sputtering Cathodes Electric conductors Insulators Ion beams Magnets Refractory metals Space charge Vapor pressure |