摘要 : As an alternative to traditional photolithography, printing processes are widelyexplored for the patterning of customizable devices. However, to date, themajority of high-resolution printing processes for functional nanomaterialsa... 展开 As an alternative to traditional photolithography, printing processes are widelyexplored for the patterning of customizable devices. However, to date, themajority of high-resolution printing processes for functional nanomaterialsare additive in nature. To complement additive printing, there is a need forsubtractive processes, where the printed ink results in material removal,rather than addition. In this study, a new subtractive patterning approach thatuses electrohydrodynamic-jet (e-jet) printing of acid-based inks to etchnanoscale zinc oxide (ZnO) thin films deposited using atomic layer deposition(ALD) is introduced. By tuning the printing parameters, the depth andlinewidth of the subtracted features can be tuned, with a minimum linewidthof 11 μm and a tunable channel depth with ≈5 nm resolution. Furthermore,by tuning the ink composition, the volatility and viscosity of the ink can beadjusted, resulting in variable spreading and dissolution dynamics at thesolution/film interface. In the future, acid-based subtractive patterning usinge-jet printing can be used for rapid prototyping or customizable manufacturingof functional devices on a range of substrates with nanoscale precision. 收起