摘要 : Erbium-ytterbium co-doped aluminium oxide (Al2O3:Er3+:Yb3+) thin films were deposited on thermally oxidized silicon wafers using reactive radio frequency co-sputtering deposition. The effects of deposition parameters (including ox... 展开
作者 | Wang~ Renjie Frankis~ Henry C. Mbonde~ Hamidu M. Bonneville~ Dawson B. Bradley~ Jonathan D. B. |
---|---|
作者单位 | |
期刊名称 | 《Optical Materials》 |
页码/总页数 | 110692.1-110692.14 / 14 |
语种/中图分类号 | 英语 / TB1 |
关键词 | Rare-earth-doped glass Aluminum oxide Erbium Ytterbium Photoluminescence Lifetime Energy transfer Quenching fraction Near infrared Optical amplifiers Sputtering deposition Thin films |
DOI | 10.1016/j.optmat.2020.110692 |
馆藏号 | TB-069 |