摘要 : We fabricated large-area stacked complementary plasmonic crystals (SC PICs) by employing ultraviolet nanoimprint lithography. The SC PICs were made on silicon-on-insulator substrates consisting of three layers: the top layer conta... 展开 We fabricated large-area stacked complementary plasmonic crystals (SC PICs) by employing ultraviolet nanoimprint lithography. The SC PICs were made on silicon-on-insulator substrates consisting of three layers: the top layer contacting air was a perforated Au film, the bottom layer contacting the buried oxide layer included an Au disk array corresponding to the holes in the top layer, and the middle layer was a Si photonic crystal slab. The SC PICs have prominent resonances in optical wavelengths. It is shown that the fabricated PICs were precise in structure and uniform in their optical properties. We examined the photoluminescence (PL) enhancement of monolayer dye molecules on the SC PIC substrates in the visible range and found large PL enhancements of up to a 100-fold in comparison with dye molecules on nonprocessed Si wafers. 收起