摘要 : Si(110) surface morphology evolution under normal-incident Ar+ ion sputtering has been studied as a function of Si temperature with the ion energy of 1.5keV and the ion flux 20μA/cm2. During temperature rising from room temperatur... 展开
作者 | Qi Le-Jun Ling Li Li Wei-Qing Yang Xin-Ju Gu Chang-Xin Lu Ming |
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作者单位 | |
英文名称 | Surface morphology evolution of Si(110) by ion sputtering as a function of sample temperature |
期刊名称 | 《中国物理(英文版)》 |
期刊英文名称 | 《Chinese Physics B》 |
页码/总页数 | 1626-1630 / 5 |
语种/中图分类号 | 汉语 / O4 |
关键词 | sputtering surface diffusion silicon nanostructuring models of nonlinear phenomena |
基金项目 | Project supported by the National Natural Science Foundation of China (Grant No 10374016), and the Science and Technology Commission of Shanghai (Grant No 03DJ14001). |
收录情况 | CSCD |