[期刊]
  • 《Plasma Sources Science & Technology》 2023年32卷4期

摘要 : The behavior of the ground state neutral and singly ionized atoms is studied in multipulse high power impulse magnetron sputtering processes. The time-resolved two-dimensional laser induced fluorescence was used for imaging the di... 展开

作者 Hnilica~ J.   Klein~ P.   Vasina~ P.   Snyders~ R.   Britun~ N.  
作者单位
期刊名称 《Plasma Sources Science & Technology》
总页数 12
语种/中图分类号 英语 / O53  
关键词 sputtering   multipulse   HiPIMS   discharge   LIF   AAS   THIN-FILMS   DEPOSITION RATE   PULSED DC   POWER   COATINGS   PLASMA   ENHANCEMENT   TRANSPORT  
馆藏号 N2008EPST0011348
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