摘要 : Selective diamond films on roughened Si(100) substrates with patternings have been achieved by microwave plasma chemical vapor deposition (MP-CVI)). The films have been characterized by scanning electron microscopy (SEM) and Raman... 展开
作者 | Zhang W. Xia Y. |
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期刊名称 | 《Diamond and Related Materials》 |
总页数 | 4 |
语种/中图分类号 | 英语 / TQ16 TQ127 TQ164 |
关键词 | diamond films deposition chemical vapor deposition |
馆藏号 | N2008EPST0008224 |