摘要 : The total energy flux density delivered to an electrically isolated substrate in a low-pressure pulsed DC hollow cathode plasma jet sputtering system during TiO2 thin film deposition has been quantified. The plasma source was oper... 展开
作者 | Cada M Virostko P Kment S Hubicka Z |
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作者单位 | |
期刊名称 | 《Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology》 |
总页数 | 7 |
语种/中图分类号 | 英语 / TB79 |
关键词 | Hollow cathode Plasma jet Sputtering Pulsed DC Energy influx on substrate TiO2 RF |
馆藏号 | N2007EPST0002834 |