摘要 : High-quality ZnO films were successfully prepared on Si wafers by low-pressure MO-CVD using zinc acetylacetonate (Zn(C_5H_4O_2)_2) and oxygen. The c-axis oriented ZnO films were grown on p-type Si wafers at temperature of 520℃ wi... 展开
作者 | K. Haga T. Suzuki Y. Kashiwaba H. Watanabe B.P. Zhang Y. Segawa |
---|---|
作者单位 | |
期刊名称 | 《Thin Solid Films》 |
页码/总页数 | p.131-134 / 4 |
语种/中图分类号 | 英语 / TB3 |
关键词 | ZnO film buffer layer Si substrate photoluminescence |
馆藏号 | TB-183 |