摘要 : Second generation proximity x-ray lithography (PXL-Ⅱ), which uses shorter incident x-ray wavelengths and resist materials, is expected to be a candidate for next generation lithography. In the PXL-Ⅱ technique, the x-ray waveleng... 展开
作者 | K. Kise K. Marumoto H. Watanabe K. Itoga T. Kumada H. Sumitani T. Kitayama M. Amemiya Y. Watanabe K. Uda |
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作者单位 | |
期刊名称 | 《Journal of Vacuum Science & Technology. B, Microelectronics Processing and Phenomena》 |
页码/总页数 | p.2953-2957 / 5 |
语种/中图分类号 | 英语 / O4 |
馆藏号 | TB-161 |