摘要 : Arc and glow discharges are defined based on their cathode processes. Arcs are characterized by collective electron emission, which can be stationary with hot cathodes (thermionic arcs), or non-stationary with cold cathodes (catho... 展开
作者 | Anders~ A |
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作者单位 | |
期刊名称 | 《Thin Solid Films》 |
页码/总页数 | p. 22-28 / 7 |
语种/中图分类号 | 英语 / TB3 |
关键词 | 444 : sputtering 373 : plasma processing and deposition arcing target poisoning ALUMINUM-OXIDE VACUUM ARCS POWER DENSITIES CATHODE SPOTS PULSED DC MAGNETRON FILMS PLASMA GENERATION BREAKDOWN |
馆藏号 | TB-183 |